JPS6127465B2 - - Google Patents

Info

Publication number
JPS6127465B2
JPS6127465B2 JP56192360A JP19236081A JPS6127465B2 JP S6127465 B2 JPS6127465 B2 JP S6127465B2 JP 56192360 A JP56192360 A JP 56192360A JP 19236081 A JP19236081 A JP 19236081A JP S6127465 B2 JPS6127465 B2 JP S6127465B2
Authority
JP
Japan
Prior art keywords
target
magnetic pole
magnet
base
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56192360A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5893872A (ja
Inventor
Hidefumi Funaki
Takehiro Sakurai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Canon Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Anelva Corp filed Critical Canon Anelva Corp
Priority to JP19236081A priority Critical patent/JPS5893872A/ja
Priority to GB08231830A priority patent/GB2110719B/en
Priority to FR8219696A priority patent/FR2517330B1/fr
Priority to DE19823244691 priority patent/DE3244691C3/de
Publication of JPS5893872A publication Critical patent/JPS5893872A/ja
Publication of JPS6127465B2 publication Critical patent/JPS6127465B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3497—Temperature of target

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Thin Magnetic Films (AREA)
JP19236081A 1981-11-30 1981-11-30 スパツタリング装置 Granted JPS5893872A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP19236081A JPS5893872A (ja) 1981-11-30 1981-11-30 スパツタリング装置
GB08231830A GB2110719B (en) 1981-11-30 1982-11-08 Sputtering apparatus
FR8219696A FR2517330B1 (fr) 1981-11-30 1982-11-24 Appareil de projection de metal sur un substrat, en particulier du type a magnetron
DE19823244691 DE3244691C3 (de) 1981-11-30 1982-11-30 Magnetron-Kathodenzerstäubungs-Anlage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19236081A JPS5893872A (ja) 1981-11-30 1981-11-30 スパツタリング装置

Publications (2)

Publication Number Publication Date
JPS5893872A JPS5893872A (ja) 1983-06-03
JPS6127465B2 true JPS6127465B2 (en]) 1986-06-25

Family

ID=16289978

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19236081A Granted JPS5893872A (ja) 1981-11-30 1981-11-30 スパツタリング装置

Country Status (1)

Country Link
JP (1) JPS5893872A (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06311690A (ja) * 1993-04-19 1994-11-04 Toyo Electric Mfg Co Ltd 回転電機のハウジング冷却装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3480245D1 (en) * 1983-12-05 1989-11-23 Leybold Ag Magnetron-cathodes for the sputtering of ferromagnetic targets
JP2602807B2 (ja) * 1985-09-27 1997-04-23 株式会社島津製作所 スパツタ用ターゲツトアセンブリ

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57158381A (en) * 1981-03-27 1982-09-30 Nippon Sheet Glass Co Ltd Magnetron sputtering device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06311690A (ja) * 1993-04-19 1994-11-04 Toyo Electric Mfg Co Ltd 回転電機のハウジング冷却装置

Also Published As

Publication number Publication date
JPS5893872A (ja) 1983-06-03

Similar Documents

Publication Publication Date Title
US3878085A (en) Cathode sputtering apparatus
JPS58221275A (ja) スパツタリング装置
US5154623A (en) Eddy current type brake system
ATE47504T1 (de) Magnetronkatode zum zerstaeuben ferromagnetischer targets.
KR960015666A (ko) 평면 마그네트론 스퍼터링 장치
JPS60193236A (ja) マグネトロン陰極装置
JPS6164879A (ja) 平面マグネトロン・スパッタリング陰極組立体
US6039855A (en) Target for the sputtering cathode of a vacuum coating apparatus and method for its manufacture
US2941045A (en) Magnetic recording
JPS6127465B2 (en])
JP2967597B2 (ja) ポテンショメータ
GB2110719A (en) Sputtering apparatus
JPH039299Y2 (en])
JPS6043001B2 (ja) 永久磁石アセンブリの製造方法
JP2823862B2 (ja) マグネトロンスパッタ装置
JP2602807B2 (ja) スパツタ用ターゲツトアセンブリ
JPS5813622B2 (ja) マグネトロン型スパッタ装置
FR2368132A1 (fr) Plaque d'adherence a magnetisme permanent
JPS60121269A (ja) スパッタ装置
JP2604442B2 (ja) マグネトロンスパッタ装置
JPS6254837A (ja) 光学系駆動装置
JP2000017435A5 (en])
JPS587891A (ja) 磁気センサ装置
JPS5843172B2 (ja) 電磁力を溶融金属に発生せしめるための溶融金属冷却鋳型
JPS6328986B2 (en])